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Lithography workshop

Published on 7 June 2018

Lithography Workshop:  
from optical to Alternative patterning technologies

Lithography is and will remain the key knob for the development and ramp-up of any technology. Depending on the challenge of the design rules, the patterning strategy will define the future architecture and performances of your device. On this landscape, optical lithography represents the reference lithography solution. Nevertheless, resolution and nowadays alignment performances are the key drivers from the process side. When cost of ownership starts to be taken into account in the decision chain balance, final decision of the manager has to remain pragmatic. In that context, alternative patterning techniques may have a high-level of competitive advantages, as they could offer challenging and credible industrial compromises.

The workshop will present the “LETI lithocluster” environment.

This event will allow you to have a detailed overview of the LETI pilot line in terms of patterning capability:
  • R&D optical lithography 
  • The evolution of the LETI lithography capabilities with the start-up of a new 193nm immersion program 
  • A general overview on the advanced works focused on three alternative patterning technologies currently under assessment: DSA, Full wafer scale imprint and Massively parallel Direct write, respectively done in partnership with ARKEMA, EV Group and MAPPER. Presentations will be both technical and business oriented.

This workshop will also provide you with insightful views from leading executives, scientists and entrepreneurs and will give you the opportunity to broaden your business network.


Workshop Technical Program

​08:30 am              Registration & Welcome coffee
​09:00 am
  •  Opening Session by Laurent Pain Patterning program manager & business development  - 5 min

  • Introduction: the importance of lithography in today's technologies – 40min

         -  Lithography and process variability assumptions for silicon chip manufacturing - Bertrand Le Gratiet - ‎STMicroelectronics -                Senior Principal Engineer, Technical Patterning Coordinator -  20 min

         -  Lithography technologies for More than Moore devices – YOLE – Amandine Pizzagalli  – 20 min

  • Optical lithography – 30 min
    - Overview of optical lithography capability at Leti: capability and achievements –Nacima Allouti Optical lithography program, Leti
    The take-off of immersion lithography at Leti – Michael May – immersion scanner leader

​​10h30                   Coffee Break – 15min   

  • ​Alternative lithography 
- MAPPER technology outlook– 30 min 

                MAPPER technology status : Marco Wieland - CTO (to be confirmed)
                FLX-1200 ramp-up status at Leti – Jonathan Pradelles – Leti MAPPER tool team leader 

- DSA technology: development status and application fields for CMOS and out of CMOS – 30 min
               Material and DSA technology insertion demonstration – Joint presentation:

                    - Celia Nicolet DSA material development manager – ARKEMA
                    - Maxime Argoud DSA process integration team leader – Leti

The joint EVG-Leti program for NIL technology assessment    – 30 min

             EVG NIL technology development - M Wimplinger EVG – Director Business Unit Technology
             INSPIRE program : latest results - Hubert Teyssedre Leti NIL team leader 

  • Conclusion & wrap-up
- The Leti LITHOCLUSTER environment  - Laurent Pain Patterning program manager & business development – 15 min
- Wrap up

12:30 pm

​End of the workshop and Lunch 


  • Lithography workshop: € 100

  • Registration includes 
     - Morning coffee breaks 

  • Register for Lithography workshop:                       

More info

  • General Chair: Laurent Pain, CEA-Leti