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Our mission is to provide software tools to improve the quality process of chip production. Maintain strong links with cutting-edge fundamental research and applies this asset to deliver tailor-made solutions for each client.
Aselta currently offers two families of software solutions: Inscale and SIMPL.
Inscale - Mask Data Preparation: Inscale is a global mask data preparation solution, providing improvements in pattern fidelity and energy latitude. It relies on mask proximity correction to address short, mid and long-range effects. Because it is highly flexible, Inscale is currently applied by industrial customers to varied use cases, from process matching to dose combination.
SIMPL - SEM Image Measurement Platform: SIMPL is a SEM tool-independent metrology toolbox relying on a model-based contour extraction. Its unique API makes it exceptionally powerful for advanced shape manipulation. Operationally, SIMPL combines offline metrology with inspection solutions, to improve accuracy in the customer's production process.
Very soon, Aselta will provide a solution to assist CD-SEM users worldwide making sure their measurements are reliable – Aselta
IQ. This comes from the assessment of the quality of the acquired SEM image, assisting in detecting tool drift, excluding metrology outliers and improving APC flows.
Through its joint lab with Leti, Aselta continues to develop top-notch technology for wafer fabs and maskshops assisting customers worldwide improving their pattern fidelity, CD uniformity, process control, OPC / MPC modeling and much more.
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CEA is a French government-funded technological research organisation in four main areas: low-carbon energies, defense and security, information technologies and health technologies. A prominent player in the European Research Area, it is involved in setting up collaborative projects with many partners around the world.