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Published on 5 April 2022

Aselta operates in the IC manufacturing world, and provides model-based advanced data preparation solutions for mask patterning based on E-Beam technology as well as advanced metrology solutions for scanning electron microscopes.

Our mission is to provide software tools to improve the quality process of chip production. Maintain strong links with cutting-edge fundamental research and applies this asset to deliver tailor-made solutions for each client.

Aselta currently offers two families of software solutions: Inscale and SIMPL.

Inscale - Mask Data Preparation: Inscale is a global mask data preparation solution, providing improvements in pattern fidelity and energy latitude. It relies on mask proximity correction to address short, mid and long-range effects. Because it is highly flexible, Inscale is currently applied by industrial customers to varied use cases, from process matching to dose combination.

SIMPL - SEM Image Measurement Platform: SIMPL is a SEM tool-independent metrology toolbox relying on a model-based contour extraction. Its unique API makes it exceptionally powerful for advanced shape manipulation. Operationally, SIMPL combines offline metrology with inspection solutions, to improve accuracy in the customer's production process.

Very soon, Aselta will provide a solution to assist CD-SEM users worldwide making sure their measurements are reliable – Aselta IQ. This comes from the assessment of the quality of the acquired SEM image, assisting in detecting tool drift, excluding metrology outliers and improving APC flows.

Through its joint lab with Leti, Aselta continues to develop top-notch technology for wafer fabs and maskshops assisting customers worldwide improving their pattern fidelity, CD uniformity, process control, OPC / MPC modeling and much more.