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Advanced Materials & Prototyping pilot line

Published on 13 October 2020

Innovation and industry crossroads - Closing the gap between Advanced Materials and Industrial Applications

Tuesday, October 13, 2020 | 08:30 - 12:30


CEA-Leti's R&D pilot line is a set of best-in-class clean-room facilities running 24/7 and offering recognized expertise covering all the key fields of core process technologies: lithography, bonding, deposition, epitaxy growth, CMP… Fully equipped with a state-of-the-art toolset, the pilot line covers the full range of services from materials to a complete functional device.

Indeed, material science is essential for bringing new functionalities at device level in microelectronics and photonics. Material selection, deposition and integration strategy require careful development to reach industrial maturity that takes into account cost of ownership and device functionality constraints. Furthermore, the prototyping pilot line can support the development of multiple technologies for a broad band of applications. 

These include advanced CMOS, memory, quantum computing, photonics and M&NEMS. This advanced manufacturing cluster is supported by a nano-characterization ecosystem offering the complete possibility to model, characterize and optimize device performance. On the operational side, CEA-Leti has deployed a shuttle lot strategy on its key core technologies to quickly raise technology manufacturing maturity and ensure faster technology transfer. This approach is compatible with the institute's multi-project wafer program that allows its partners to validate technology solutions on their private designs and devices.

This workshop will highlight some of CEA-Leti's very recent material developments targeting the introduction of sustainability material and it will describe the institute's clean-room environment, explaining how its manufacturing know-how is dedicated to helping our partners achieve their goals for device performance, maturity and cycle-time performance.

Target Audience

Industrials : 

  • CTO, R&D and technical engineers and managers 
  • Industrials in high-end applicationS

Academia : 

  • Device experts
  • Material-science engineers and experts

Co-General Chairs : Laurent Pain and Fabrice Nemouchi, CEA-Leti

Tuesday, October 13, 2020


Registration and Welcome Coffee


​ Opening Session 

  • Laurent Pain, Head of Business & Development, CEA-Leti,
  • Fabrice Nemouchi, Head of Integration & Pre-industrialization Lab, CEA-Leti



SESSION #1: industrial experiences on LETI technology platform

To be defined

  • ST Tours

To be defined

  • Alédia




​SESSION #2: LETI Platforms

Next Generation Computing Alliance : Europe R&D platform in RTOs

  • Yannick Le Tiec, European Program Manager, CEA-Leti

LETI Plateform & High recurrent batches

  • Laurent Clavelier, Head of technological platforms, CEA-Leti 

Nano-characterization platform: synergies with GIANT large scale instruments

  • Patrice Gergaud, X-Ray team leader, CEA-Leti


Coffee Break & Networking



SESSION #3 : Material for advanced memories

To be defined

  • Applied Material: To be defined

To be defined

  • Chiara Sabbione, Process Deposition Engineer, CEA-Leti




SESSION #4 : Sustainable Materials

Towards saving and substituting critical materials in ICT devices

  • Thierry Baron, Head of Laboratory, CNRS-LTM

To be defined

  • To be defined

To be defined

  • JXNippon, To be defined


Closing Session 

LETI technology platform : the incubator accelerator from idea to start up
  • Philippe Andreucci, CEA-Leti