Subtitle site (optional)
AI Tutorial for Leti Innovation Days. This half-day workshop will help you understand what artificial intelligence is. Keynoters will also discuss the importance of neurosciences.
Explore the power of distributed artificial intelligence, also called "Edge AI" during the Leti innovation Days on June 24-28, 2019 in Grenoble. Join to trigger the creative part of your brain and create your own innovation with AI now.
All about our media partners : Yole and i-Micronews
Lithography Workshop: from optical to Alternative patterning technologies Lithography is and will remain the key knob for the development and ramp-up of any technology. Depending on the challenge of the design rules, the patterning strategy will define the future architecture and performances of your device. On this landscape, optical lithography represents the reference lithography solution. Nevertheless, resolution and nowadays alignment performances are the key drivers from the process side. When cost of ownership starts to be taken into account in the decision chain balance, final decision of the manager has to remain pragmatic. In that context, alternative patterning techniques may have a high-level of competitive advantages, as they could offer challenging and credible industrial compromises.
Workshop Technical Program
- Lithography and
process variability assumptions for silicon chip manufacturing - Bertrand Le Gratiet - STMicroelectronics - Senior
Principal Engineer, Technical Patterning Coordinator - 20 min
- Lithography technologies for More than Moore devices – YOLE –
Amandine Pizzagalli – 20 min
Optical lithography – 30 min- Overview of optical lithography capability at Leti: capability and achievements –Nacima Allouti Optical lithography program, Leti- The take-off of immersion lithography at Leti – Michael May – immersion scanner leader
MAPPER technology status : Marco Wieland - CTO (to be confirmed) FLX-1200 ramp-up status at Leti – Jonathan Pradelles – Leti MAPPER tool team leader
- Celia Nicolet DSA material development manager – ARKEMA - Maxime Argoud DSA process integration team leader – Leti
EVG NIL technology development - M Wimplinger EVG – Director Business Unit Technology INSPIRE program : latest results - Hubert Teyssedre Leti NIL team leader
End of the workshop and Lunch
Lithography workshop: € 100
Registration includes - Morning coffee breaks
CEA is a French government-funded technological research organisation in four main areas: low-carbon energies, defense and security, information technologies and health technologies. A prominent player in the European Research Area, it is involved in setting up collaborative projects with many partners around the world.